R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics
Bias-dependent scanning tunneling microscopy (STM), used in conjunction with atomic-charge superposition calculations, is shown to provide information on both atomic and electronic surface structure. Si(111)-(7×7) STM images measured with different bias voltages are compared with a number of recent structural models. Striking agreement is found with the stacking-fault-adatom model of Takayanagi. The unit-cell asymmetry found at negative sample bias is attributed to a stacking fault in one half of the unit cell, locally modifying the surface electronic structure. © 1986 The American Physical Society.
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics
Ellen J. Yoffa, David Adler
Physical Review B
E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
J. Schneir, R. Sonnenfeld, et al.
Journal of Applied Physics