British Journal of Applied Physics

Paper

20 Nov 2002

Annealing of residual stress in silicon monoxide films [1]

View publication

Abstract

No abstract available.

Paper

Role of the intermetallic compounds in determining the superconducting transition temperature of superimposed metal films

H.L. Caswell

Physics Letters

Paper

Characteristics of the annealing kinetics of tin films deposited at 88°K

J.R. Priest, C. Chiou, et al.

Journal of Applied Physics

Paper

Operation of the Cryogenic Continuous Film Memory Cell

J.D. Barnard, R.H. Blumberg, et al.

Proceedings of the IEEE

Paper

Low-temperature properties of evaporated lead films

H.L. Caswell, J.R. Priest, et al.

Journal of Applied Physics

View all publications