Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
A framework for parallel visualization at Pacific Northwest National Laboratory (PNNL) is being developed that utilizes the IBM Scaleable Graphics Engine (SGE) and IBM SP parallel computers. Parallel visualization resources are discussed, including display technologies, data handling, rendering, and interactivity. Several of these resources have been developed, while others are under development. These framework resources will be utilized by programmers in custom parallel visualization applications. © 2002 SPIE · 0277-786X/02/$15.00.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
M.B. Small, R.M. Potemski
Proceedings of SPIE 1989
Naga Ayachitula, Melissa Buco, et al.
SCC 2007
W.F. Cody, H.M. Gladney, et al.
SPIE Medical Imaging 1994