Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We explain how factoring polynomials over finite fields can be used in computing logarithms in fields of characteristic two, and how this has applications in cryptography. This letter describes work which is described in more detail in Coppersmith (1984)—here we concentrate on the use of computer algebra, in particular the new SCRATCHPAD system (Jenks, 1984). © 1985, Academic Press Inc. (London) Ltd.. All rights reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
John R. Kender, Rick Kjeldsen
IEEE Transactions on Pattern Analysis and Machine Intelligence
Simeon Furrer, Dirk Dahlhaus
ISIT 2005
Chai Wah Wu
Linear Algebra and Its Applications