Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
A simple algorithm which uses an indexed temporary table to perform reduction of operator strength in strongly connected regions is presented. Several extensions, including linear function test replacement, are discussed. These algorithms should fit well into an integrated package of local optimization algorithms. © 1977, ACM. All rights reserved.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Gal Badishi, Idit Keidar, et al.
IEEE TDSC
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Limin Hu
IEEE/ACM Transactions on Networking