Conference paper
Top-surface-imaging resist for deep UV lithography
Scott A. MacDonald, H. Schlosser, et al.
International Technical Conference on Photopolymers 1991
We report the first observation, to our knowledge, of amplified scattering (beam fanning) in a photorefractive polymer. The manifestations of beam fanning and the implications for two-beam coupling measurements are investigated expirementally, and optimal geometrics for observing or avoiding fanning are presented. © 1998 Optical Society of America.
Scott A. MacDonald, H. Schlosser, et al.
International Technical Conference on Photopolymers 1991
C.W. Dirk, R.J. Twieg, et al.
JACS
M.C.J.M. Donckers, S.M. Silence, et al.
Optics Letters
M. Stähelin, Cecilia A. Walsh, et al.
Journal of Applied Physics