Advanced applications of semiconductor epitaxy for cutting edge integrated circuit technology

D.K. Sadana; M. Yang; S.W. Bedell; A. Reznicek; J.P. De Souza; H.J. Hovel

doi:10.1149/1.2355878

ECS Meeting 2006

Conference paper

29 Oct 2006

Advanced applications of semiconductor epitaxy for cutting edge integrated circuit technology

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Abstract

Advanced applications of epitaxy in enabling future CMOS scaling are discussed. Novel processes to create substrates for hybrid oriented technology (HOT), superHOT and single wafer sSOI are described. copyright The Electrochemical Society.

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Abstract

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