D.D. Awschalom, J.-M. Halbout
Journal of Magnetism and Magnetic Materials
Paper
Action of far-ultraviolet radiation (185 nm) on poly(ethylene terephthalate) films: a method for controlled dry-etching
Abstract
Far-ultraviolet light (185 nm) rapidly etches poly(ethylene terephthalate) films without any subsequent processing. Both non-oxidative and oxidative mechanisms are operative. © 1982.
Related
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Lawrence Suchow, Norman R. Stemple
JES
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997