M.J. Rooks, G.M. Cohen, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Absolute rate constants have been determined for the reaction of SiH2 with the diatomics HCl, Cl2, NO and O2. Upper limits are reported for rate constants for the reaction of SiH2 with N2 and CO. Comparisons are made between the reactivity of silylene, singlet methylene and halogenated silylenes. © 1988.
M.J. Rooks, G.M. Cohen, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
P.M. Mooney, F.K. LeGoues, et al.
Journal of Applied Physics
Khaled Ismail, S. Rishton, et al.
IEEE Electron Device Letters
S.J. Koester, K.L. Saenger, et al.
DRC 2004