Oliver Bodemer
IBM J. Res. Dev
No abstract available.
Oliver Bodemer
IBM J. Res. Dev
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
David A. Selby
IBM J. Res. Dev
S.M. Sadjadi, S. Chen, et al.
TAPIA 2009