Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
This note summarizes a report with the same title, where a study was carried out regarding a unified approach, proposed by Kojima, Mizuno and Yoshise, for interior point algorithms for the linear complementarily problem with a positive semi-definite matrix. This approach is extended to nonsymmetric matrices with nonnegative principal minors. © 1991.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
J. LaRue, C. Ting
Proceedings of SPIE 1989
Michael E. Henderson
International Journal of Bifurcation and Chaos in Applied Sciences and Engineering
James Lee Hafner
Journal of Number Theory