A Study of MIMcap TDDB Reliability Scaling

Abstract— Metal-Insulator-Metal capacitors (MIMcap) have been used widely for high performance on-chip circuit decoupling. Due to its extensive applications (covering a large portion of the chip area), it is critical to understand its reliability scaling, more specifically, its Time Dependent Dielectric Breakdown (TDDB) scaling from individual structures to chip level. This study shows that MIMcap TDDB may follow the traditional Poisson area scaling or perimeter scaling, depending on the sample process vintages.