Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
We present a new relaxation algorithm for solving the conditional continuous and discrete p-center problems. © 2009 Elsevier B.V. All rights reserved.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
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IS&T/SPIE Electronic Imaging 2002
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