Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
We study an uncapacitated facility location model where customers are served by facilities of level one, then each level one facility that is opened must be assigned to an opened facility of level two. We identify a polynomially solvable case, and study some valid inequalities and facets of the associated polytope. © 2014 EDP Sciences, ROADEF, SMAI, .
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Ziyang Liu, Sivaramakrishnan Natarajan, et al.
VLDB
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
Fan Zhang, Junwei Cao, et al.
IEEE TETC