George Markowsky
J. Math. Anal. Appl.
No abstract available.
George Markowsky
J. Math. Anal. Appl.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Matthew A Grayson
Journal of Complexity
Alfred K. Wong, Antoinette F. Molless, et al.
SPIE Advanced Lithography 2000