Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Paper
A note on state splitting
Abstract
Using state splitting methods, we construct nice matrix representatives for arbitrary subshifts of finite type. © 1984 American Mathematical Society.
Related
Conference paper
Learning Reduced Order Dynamics via Geometric Representations
Imran Nasim, Melanie Weber
SCML 2024
Conference paper
Characterization of a next generation step-and-scan system
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
Conference paper
Convergence properties of multi-dimensional stack filters
Peter Wendt
Electronic Imaging: Advanced Devices and Systems 1990