Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
No abstract available.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Liat Ein-Dor, Y. Goldschmidt, et al.
IBM J. Res. Dev
Hendrik F. Hamann
InterPACK 2013
Joel L. Wolf, Mark S. Squillante, et al.
IEEE Transactions on Knowledge and Data Engineering