Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
In this note, we give a 1.47-approximation algorithm for the preemptive scheduling of jobs with release dates on a single machine so as to minimize the weighted sum of job completion times; this problem is denoted by 1|rj, pmtn|∑jwjCj in the notation of Lawler et al. Our result improves on a 2-approximation algorithm due to Hall et al. Math. Oper. Res. 22 (1997) 513-544, and also yields an improved bound on the quality of a well-known linear programming relaxation of the problem.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Yixiong Chen, Weichuan Fang
Engineering Analysis with Boundary Elements
John A. Hoffnagle, William D. Hinsberg, et al.
Microlithography 2003
Shu Tezuka
WSC 1991